SPA multi-shot of changing custom patterns
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Name | SPA multi-shot of changing custom patterns |
Permalink | https://serialemscripts.nexperion.net/script/82 |
Category | Single Particle |
Language | SerialEM Scripting |
Description | Multiple records of cherry-picked features. Suitable for certain in situ SPA. |
Author | shenping wu |
Version History
Version 1
This script requires additional scripts to be run – please refer to the Required Scripts section below.
Upload date
February 26, 2025
Download count
19
SerialEM version ≥
4.2
Required Scripts
The following scripts are required to run this script, either because the are called directly or they provide functions:
Documentation
SerialEM v4.2beta 3 (Feb.28 2024) or later is required.
It requires a grid with regular hole pattern as this is needed for defining the hole vectors. Instructions available at https://sphinx-emdocs.readthedocs.io/en/latest/SerialEM_note_define-IS-vectors.html
After the vectors are defined, any type of grids (lacey, lamella) may be used for data collection.
Each custom multishot pattern is in its own group. Points in one group must be on the same tile of the square montage. If they are spread across multiple tiles, the calculated Image Shift vector can be very off.
The first point of each group is for positioning and autofocusing, preferably on carbon (Set Low dose - focus position on tilt axis = 0 um). The remaining points form a custom pattern. Each group must contain a minimum of two points.
When cherry picking the points, the following factors need to be considered:
1) spacing between points can't be too small to avoid overlapping of neighboring exposures.
2) the first point should be roughly in the middle of the custom pattern so that image shifts are minimized.
3) the overall size of the pattern needs to be reasonable so that the maximum image shift is within the optimal performance of the instrument.
4) one pattern (points within one group) must be on a single tile.
License
This code can be shared and adapted under the Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0) License (https://creativecommons.org/licenses/by-nc-sa/4.0/)